The Solarus® II plasma cleaner is a cutting-edge plasma tool designed specifically for the purpose of eliminating hydrocarbon contamination from TEM and SEM samples and holders.

Advantages

This tool is particularly valuable for researchers aiming to reliably eliminate organic surface contaminants in a secure and efficient manner.

  • Integrated holder bakeout and storage: Decreases the tool’s footprint and cost of ownership.
  • Enhanced user interface: Use preoptimized recipes for consistent results; as well as guided workflows to ensure proper operation when venting and evacuating the chamber.
  • New system, same great performance: Eliminate hydrocarbons on SEM and TEM samples that may impact analysis.
  • Low-power operation (2 W): Gently clean delicate samples (e.g., holey carbon grids); as well as prepare hydrophilic surfaces on carbon grids for cryo-electron microscopy.
Minimize surface damage and maintain the integrity of silicon

Minimize surface damage and maintain the integrity of silicon. After plasma cleaning with the Solarus II, there is minimal amorphous surface damage and the sample integrity is maintained. Protocol: hydrogen and oxygen; duration: 5 min; sample: silicon 110; TEM image: TF20. Video Credit: Gatan, Inc.

Remove hydrocarbon accumulation on semiconductor device

Remove hydrocarbon accumulation on semiconductor device. After cleaning with the Solarus II system, amorphous surface damage and crosslinking are eliminated. Protocol: hydrogen and oxygen; duration: 5 min; sample: a semiconductor device; SEM image. Video Credit: Gatan, Inc.

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