TESCAN SOLARIS FIB-SEM Workbench is a ready-to-run FIB-SEM solution for the fabrication of nanostructures and nanotechnology-based microscale functional devices.

TESCAN SOLARIS integrates the most accurate Focused Ion Beam with UHR-SEM that features TriLens™ immersion optics in order to guarantee the best possible connection between ultra-high-resolution SEM imaging and ion beam milling.

The Orage™ Ga+ FIB column has been developed to satisfy more and more stringent focused ion beam nanofabrication needs. Thanks to its high FIB resolution, an extensive range of beam current choices, and sophisticated patterning control with TESCAN DrawBeam™, the Orage™ FIB column regularly fabricates even the most difficult structures.

The optional automation modules enable batch processing and unsupervised implementation of preset operations, such as making arrays of structures or TEM lamella preparation.

Featuring the Triglav™ SEM column including immersion optics to enable a crossover-free electron beam path, the TESCAN SOLARIS ensures outstanding high-resolution performance over the complete range of beam energies.

A field-free analytical mode has been provided for the characterization and microanalysis of materials impacted by the immersion magnetic field, and for live SEM observation of the milling process.

Moreover, the Triglav™ features both backscattered electron detectors and in-column secondary detectors. A huge analytical vacuum chamber can house a broad range of analytical accessories and chamber-mounted detectors.

The latest nanofabrication with TESCAN SOLARIS can be further improved with optional gas injectors and an extensive range of gas precursors for selective etching or ion beam deposition. An electrostatic beam blanker choice for the SEM column enables nanopatterning by an electron beam.

Driven by TESCAN Essence™—TESCAN’s modular customizable graphical user-interface - TESCAN SOLARIS simply gets converted from a multiuser, multi-purpose workstation to a workflow-optimized turn-key solution for continual nanofabrication tasks.

Key Benefits

  • Multiple gas injection system options are provided with a range of precursor gases
  • Superior ion beam performance
  • Chamber extension options for up to 12″ wafer inspection
  • Crossover-free ultra-high-resolution SEM imaging
  • User-friendly modular software user interface
  • High-precision nanopatterning engine for ion and electron beams
  • Python scripting interface for sophisticated user-defined experiments

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